Content
Synchrotron Instruments
Biopolymer Structural Analysis System
This is a specialized instrument for structural analysis of biopolymers such as proteins. Since the rotation stage for the sample is used to measure a crystal of approximately 10 μm, the rotation center displacement of the rotary stage for the sample is kept at 1 μm or less. Also since fluctuation of the sample caused by high-intensity X-rays is a problem, this instrument is equipped with a shutter that can be controlled to turn on and off in milliseconds. The X-ray CCD camera can approach the sample to a proximity of 40 mm to cover sufficiently the diffracted rays required for analysis. This instrument is now in service at the KEK PF (Photon Factory) BL05 in Japan.
High-Pressure Ress On-The-Spot Observer System
The instrument shown here is a base for measuring diffracted rays from a sample placed in a high-pressure state using energy dispersion and positioning adjuster. Diffracted rays can be measured using energy dispersion while the θ-2θ relationship is maintained. The detector is placed on the stage with a sample at the center and its rotation center displacement is 50 μm or less. This instrument is now in service at the SPring-8 (Super Photon ring-8 GeV) BL04B2 in Japan.
Microbeam System
The instrument shown on the left enables X-rays to be focused to submicron size through a Fresnel zone-plate. A beam like the tip of a needle is used for research on X-ray diffraction measurements and fluorescent X-ray analysis in a very small area. The Fresnel zone-plate condenser and the sample observing microscope can be toggled with the touch of a single button. Also to observe very small samples, the rotation center displacement of the rotation stage is kept at 1 μm or less. This instrument is now in service at the SPring-8 (Super Photon ring-8 GeV) BL24XU in Japan.
Exposure Evaluation Instruments
The instrument shown here was manufactured for evaluation experiments on micro-optics essential for developing next-generation semiconductor manufacturing equipment using extreme ultraviolet light. These instruments feature a clean vacuum with little contamination and a vibration isolation structure that shuts out fluctuations of the optical system. This instrument is now in service at the SPring-8 BL9 of New SUBARU in Japan.
The instrument shown here is designed for large-area deep X-ray lithography. Up to A4 mask size can be used. This instrument is now in service at the SPring-8 BL2 of New SUBARU in Japan.
X-Ray Astronomy
The instrument shown above is a goniometer on which an optical device for an X-ray telescope is mounted. The orientation of the device can be adjusted at high precision to evaluate the performance of the optical device. This instrument is now in service at the X-ray astronomy group of NAGOYA University.
The instrument shown here is used to evaluate the polarization characteristics of a sample by polarizing X-rays from an X-ray source and using the polarized light. Light from the X-ray source is separated and polarized using a channel-cut monochromator. The light is shaped at a slit chamber in a later stage and guided to the sample chamber. This instrument is now in service at CHUO University.